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A novel Si/SiGe heterojunction pMOSFET with reduced short-channel effects and enhanced drive current

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8 Author(s)
Qiqing Ouyang ; IBM Thomas J. Watson Res. Center, Yorktown Heights, NY, USA ; Chen, Xiangdong ; Mudanai, S.P. ; Wang, Xin
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A novel Si/SiGe bandgap engineered pMOSFET structure, called a high mobility heterojunction transistor (HMHJT), is proposed. Reduced short-channel effects and high drive current are predicted in this new device. Simulation results of devices with 100-nm physical gate lengths are presented. Physical effects are illustrated, and the performance is compared to the conventional Si devices. For low standby power or low leakage (high VT) applications, the off-state leakage current due to drain induced barrier lowering (DIBL) or bulk punchthrough is substantially suppressed, and a very high Ion/Ioff ratio of 6×107 is obtained in a HMHJT without any anti-punchthrough implant. This ratio is a factor of 180 higher than that of a fabricated, conventional Si device with a similar threshold voltage found in the literature. On the other hand, for lower operating power (low VT) applications, an HMHJT has a drive current 80% higher compared to an optimized Si device, while satisfying the same criteria for the off-state leakage current

Published in:

Electron Devices, IEEE Transactions on  (Volume:47 ,  Issue: 10 )

Date of Publication:

Oct 2000

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