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Characteristics of amorphous tungsten nitride diffusion barrier for metal-organic chemical vapor deposited Cu metallization

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5 Author(s)
Kim, Yong Tae ; Korea Institute of Science and Technology ; Lee, Chang Woo ; Kwon, Chul Soon ; Min, Suk‐Ki
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Electron Devices and Materials Symposium, 1994. EDMS 1994. 1994 International

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