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Process induced warpage in multitiled alumina substrates for large area MCM-D processing

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3 Author(s)
Dang, A.X.H. ; George W. Woodruff Sch. of Mech. Eng., Georgia Inst. of Technol., Atlanta, GA, USA ; Ume, I.C. ; Bhattacharya, S.K.

Electronics industries are responding to consumer demands in low-cost and high performance products for the 21st century, In order to find a low-cost solution for the future multichip module (MCM) packaging, a multitiling approach through the incorporation of several tiles on a large carrier substrate has been established in this study. The multitiling format provides simultaneous processing of several small (95-mm×135-mm) alumina tiles onto a carrier glass pallet with comparable coefficient of thermal expansion (CTE). The objective of this study is to develop materials and processes for a 300-mm×300-mm format that is scalable up to a 600 mm×600 mm substrate. The fabrication process begins with a carrier substrate on which tiles are attached using a low modulus adhesive. This composite structure is exposed to high temperature thin film process that is required for the MCM-deposited (MCM-D) processing. The tiles are detached from the carrier substrate at an elevated temperature (~4500°C). The warpage of these structures is a critical factor that determines the processability of the thin films in a manufacturing environment. This paper discusses the warpage issues associated with various stages of processing of the proposed large area MCM-D structures

Published in:

Advanced Packaging, IEEE Transactions on  (Volume:23 ,  Issue: 3 )

Date of Publication:

Aug 2000

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