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Application of the LIGA process for fabrication of gas avalanche devices

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9 Author(s)
Kim, H.K. ; Div. of Phys., Lawrence Berkeley Lab., CA, USA ; Jackson, K. ; Hong, W.S. ; Park, I.J.
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Arrays of holes having steep wall sides have been successfully prepared by using a deep X-ray lithography technique, or LIGA process, on various thicknesses (50-1,000 μm) polymethylmethacrylate (PMMA) plastic sheets. Electrical contact layers onto the top and bottom sides were deposited by metal evaporation in a vacuum. The completed LIGA devices were studied as an alternative design of the gas electron multiplier (GEM). The first measurements of performance were very promising: a lower limit to the avalanche gain of ~3,000 was obtained, and the actual gain is probably much larger. Detailed experimental results and field simulations will be described in this study. In addition, an application of a LIGA device to serve as a drift plane electrode, avoiding the angle dependency, is discussed

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Nuclear Science, IEEE Transactions on  (Volume:47 ,  Issue: 3 )