Cart (Loading....) | Create Account
Close category search window
 

Numerical simulation techniques for the study of high-power diodes for radiography

Sign In

Cookies must be enabled to login.After enabling cookies , please use refresh or reload or ctrl+f5 on the browser for the login options.

Formats Non-Member Member
$31 $13
Learn how you can qualify for the best price for this item!
Become an IEEE Member or Subscribe to
IEEE Xplore for exclusive pricing!
close button

puzzle piece

IEEE membership options for an individual and IEEE Xplore subscriptions for an organization offer the most affordable access to essential journal articles, conference papers, standards, eBooks, and eLearning courses.

Learn more about:

IEEE membership

IEEE Xplore subscriptions

5 Author(s)
Welch, D.R. ; Mission Res. Corp., Albuquerque, NM, USA ; Rose, D.V. ; Oliver, B.V. ; Hughes, T.P.
more authors

Summary form only given. In the IPROP and LSP codes, we have developed the capability for multi-dimensional simulation of dense plasmas in pulsed-power devices. The plasma modeling includes an implicit electromagnetic field solver that permits large time steps and fine resolution of plasma in one direction and coarse resolution in the other directions. The new solver is well suited to the simulations of thin surface and dense bulk plasmas. These codes use a hybrid (fluid/kinetic) description of the plasma electrons and kinetic modeling of ions. This description permits the simulation of a high-density plasma without micro time steps and zoning. In order to determine the rate at which contaminants leave the surface, we also model the electron interaction with the anode. The interaction is presently modeled utilizing Moliere multiple scattering and an energy-loss model for treating the interaction of high-energy electrons with the anode. A new model utilizing the ITS series of Monte Carlo algorithms is being implemented to more accurately simulate energy loss, scattering and production of secondary electrons. A detailed description of these models and some relevant examples will be discussed.

Published in:

Plasma Science, 2000. ICOPS 2000. IEEE Conference Record - Abstracts. The 27th IEEE International Conference on

Date of Conference:

4-7 June 2000

Need Help?


IEEE Advancing Technology for Humanity About IEEE Xplore | Contact | Help | Terms of Use | Nondiscrimination Policy | Site Map | Privacy & Opting Out of Cookies

A not-for-profit organization, IEEE is the world's largest professional association for the advancement of technology.
© Copyright 2014 IEEE - All rights reserved. Use of this web site signifies your agreement to the terms and conditions.