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Effect of vacuum ultraviolet radiation on the gap fill properties of Teflon amorphous fluoropolymer film deposited by direct liquid injection

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5 Author(s)
V. Parihar ; Dept. of Electr. & Comput. Eng., Clemson Univ., SC, USA ; R. Singh ; R. Sharangpani ; S. D. Russell
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In this work, the roles of vacuum ultraviolet (VUV) photons in improving the gap fill properties of a low dielectric constant (K) material (Teflon amorphous fluoropolymer, K=1.93) deposited by direct liquid injection assisted rapid photothermal chemical vapor deposition technique are discussed. A qualitative explanation is presented wherein it is proposed that high-energy photons provide photoexcitation of the species involved in the deposition of Teflon AFTM, thereby lowering the activation energy and migrational enthalpy required for surface diffusion leading to a higher molecular mobility on the patterned surface

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IEEE Transactions on Electron Devices  (Volume:47 ,  Issue: 7 )