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Grid-controlled 100-kV electron-beam source for SCALPEL [lithography]

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5 Author(s)
Katsap, V. ; Lucent Technol., Murray Hill, NJ, USA ; Waskiewicz, W.K. ; Sewell, P.B. ; Rouse, J.A.
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Results show that, with the grid-controlled gun, uniform beam profile can be obtained using nonuniform surface cathode. One can conclude that a traditional polished tantalum emitter might be replaced with more efficient, long lasting one in the SCALPEL grid-controlled gun. Both modeling and experimental results show the possibility of building a 100 kV electron beam source providing high-current, high-emittance, uniform electron beam for the high throughput SCALPEL exposure tool.

Published in:

Vacuum Electronics Conference, 2000. Abstracts. International

Date of Conference:

2-4 May 2000

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