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Semiconductor microlenses fabricated by one-step wet etching

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6 Author(s)
Yu-Sik Kim ; Dept. of Phys., Seoul Nat. Univ., South Korea ; Jaehoon Kim ; Joong-Seon Choe ; Young-Geun Rob
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We fabricated refractive semiconductor microlenses using a diffusion-limited chemical etching technique based an Br2 solution. The simple one-step wet etching process produced high-quality microlenses of GaAs and InP, the two most popular compound semiconductor materials used in optoelectronics. A spherical GaAs microlens with a nominal lens diameter of 30 μm exhibited a radius of curvature and focal length of 91 and 36 μm, respectively. The surface roughness, examined by atomic force microscopy (AFM), was measured to be below /spl plusmn/10 /spl Aring/. This microlens fabrication method should be readily applicable due to the simplicity in processing and the high-quality results.

Published in:

IEEE Photonics Technology Letters  (Volume:12 ,  Issue: 5 )