Characterization of a JFET operational amplifier by planned experimentation and its impact on IC manufacturing

Statistical process characterization has become an essential tool in advanced IC manufacturing to improve product quality, yield, and manufacturing efficiency. The device parameter drift of a JFET operational amplifier is discussed in terms of yield loss and product quality of analog ICs. Planned statistical experimentation was used to identify process factors that were causing the drift. The mechanisms for operational amplifier parameter drift, the improvements using statistical process characterization, and the resultant analog IC yield enhancement are described.<
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