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A generic computer simulation model to characterize photolithography manufacturing area in an IC FAB facility

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1 Author(s)
K. Prasad ; Intel Corp., Chandler, AZ, USA

The technique used to develop a generic simulation model to characterize the photolithography manufacturing area in a semiconductor FAB facility is discussed. Use of simulation to study the impact of policy decisions on key manufacturing system parameters like product cycle time, line throughput, work-in-progress inventory, and utilizations are discussed. Details of the structured modeling approach taken to develop reusable simulation models are also discussed. The simulation model was successfully validated and the results presented

Published in:

IEEE Transactions on Components, Hybrids, and Manufacturing Technology  (Volume:14 ,  Issue: 3 )