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Light induced frustration of etching in Fe doped LiNbO/sub 3/

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3 Author(s)
Barry, I.E. ; Optoelectron. Res. Centre, Southampton Univ., UK ; Eason, R.W. ; Cook, G.

Summary form only given. There is considerable interest in etching, structuring, and patterning a wide range of insulators, dielectrics, and semiconductors, for microelectronic and microphotonic device applications. The authors report a method of optical control of photoelectrochemical etching in lithium niobate doped with iron.

Published in:

Lasers and Electro-Optics, 1999. CLEO '99. Summaries of Papers Presented at the Conference on

Date of Conference:

28-28 May 1999