By Topic

High temperature performance of NMOS integrated inverters and ring oscillators in 6H-SiC

Sign In

Cookies must be enabled to login.After enabling cookies , please use refresh or reload or ctrl+f5 on the browser for the login options.

Formats Non-Member Member
$31 $13
Learn how you can qualify for the best price for this item!
Become an IEEE Member or Subscribe to
IEEE Xplore for exclusive pricing!
close button

puzzle piece

IEEE membership options for an individual and IEEE Xplore subscriptions for an organization offer the most affordable access to essential journal articles, conference papers, standards, eBooks, and eLearning courses.

Learn more about:

IEEE membership

IEEE Xplore subscriptions

3 Author(s)
Schmid, U. ; Res. & Technol., Daimler-Chrysler AG, Munchen, Germany ; Sheppard, S.T. ; Wondrak, W.

Electrical characterization up to 573 K is performed on integrated inverters with different beta ratios and 17-stage ring oscillators based on SiC NMOS technology. These devices are fabricated on a p-type 6H-SiC epitaxial layer with a doping concentration of NA=1·10 16 cm-3. The n+ source/drain regions and buried channels for depletion-mode load transistors are achieved by ion implantation of nitrogen. Direct current measurements of the inverters with a 5 V power supply yield proper output levels and acceptable noise margins both at 303 and 573 K. Dynamic measurements with square waves show the full voltage swing up to 5 kHz in this temperature range. The 17-stage ring oscillators, driven by a 5.5 V power supply, show an oscillator frequency of 625 kHz at 303 K, which corresponds to a 47 ns delay per inverter stage. This time constant increases only to 59 ns at 573 K. The temperature drift of the measured output signal is well below 30% up to this elevated temperatures. During 20 heat cycles up to 573 K in air, no measurable drift in circuit parameters occurred. In addition, only a slight dependence of the oscillator frequency on supply voltage is observed

Published in:

Electron Devices, IEEE Transactions on  (Volume:47 ,  Issue: 4 )