A comparative study of remote plasma sources for environmentally-friendly CVD chambers cleaning

Summary form only given. In this study, we compare the characteristics of a microwave-driven and magnetically-enhanced inductively coupled NF/sub 3/ discharge. Optical emission spectroscopy, quadrupole mass spectroscopy, Fourier transform infrared and etch rate measurements were used to characterize the different sources and assess the environmental impact of the clean processes. A comparative analysis of the two types of plasma sources is made with respect to implementation of this cleaning technology in an industrial environment.