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A comparative study of remote plasma sources for environmentally-friendly CVD chambers cleaning

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7 Author(s)
Raoux, S. ; Appl. Mater. Inc., Santa Clara, CA, USA ; Lai, K.C. ; Nguyen, H. ; Sarfaty, M.
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Summary form only given. In this study, we compare the characteristics of a microwave-driven and magnetically-enhanced inductively coupled NF/sub 3/ discharge. Optical emission spectroscopy, quadrupole mass spectroscopy, Fourier transform infrared and etch rate measurements were used to characterize the different sources and assess the environmental impact of the clean processes. A comparative analysis of the two types of plasma sources is made with respect to implementation of this cleaning technology in an industrial environment.

Published in:

Plasma Science, 1999. ICOPS '99. IEEE Conference Record - Abstracts. 1999 IEEE International Conference on

Date of Conference:

24-24 June 1999