Cart (Loading....) | Create Account
Close category search window

Thin film deposition of BST by pulsed ion beam evaporation

Sign In

Cookies must be enabled to login.After enabling cookies , please use refresh or reload or ctrl+f5 on the browser for the login options.

Formats Non-Member Member
$31 $13
Learn how you can qualify for the best price for this item!
Become an IEEE Member or Subscribe to
IEEE Xplore for exclusive pricing!
close button

puzzle piece

IEEE membership options for an individual and IEEE Xplore subscriptions for an organization offer the most affordable access to essential journal articles, conference papers, standards, eBooks, and eLearning courses.

Learn more about:

IEEE membership

IEEE Xplore subscriptions

3 Author(s)
Yatsui, K. ; Extreme Energy Density Res. Inst., Nagaoka Univ. of Technol., Niigata, Japan ; Ohtomo, K. ; Jiang, W.

Ablation plasma generated by an intense, pulsed ion beam was used for thin-film deposition of commercially interesting materials such as (Ba/sub x/, Sr/sub 1-x/)TiO/sub 3/. The deposition has been carried out in vacuum and with the substrate at room temperature. The deposited thin films were analyzed by using RES, AFM, SEM and XRD. The analytical results have shown that this deposition technique is applicable to many kinds of materials with very high deposition rate and low cost.

Published in:

Pulsed Power Conference, 1999. Digest of Technical Papers. 12th IEEE International  (Volume:1 )

Date of Conference:

27-30 June 1999

Need Help?

IEEE Advancing Technology for Humanity About IEEE Xplore | Contact | Help | Terms of Use | Nondiscrimination Policy | Site Map | Privacy & Opting Out of Cookies

A not-for-profit organization, IEEE is the world's largest professional association for the advancement of technology.
© Copyright 2014 IEEE - All rights reserved. Use of this web site signifies your agreement to the terms and conditions.