In this letter, we demonstrate a high-performance 0.1 /spl mu/m dynamic threshold voltage MOSFET (DTMOS) for ultra-low-voltage (i.e., <0.7 V) operations. Devices are realized by using super-steep-retrograde indium-channel profile. The steep indium-implanted-channel DTMOS can achieve a large body-effect-factor and a low V/sub th/ simultaneously, which results in an excellent performance for the indium-implanted DTMOS.
Published in:
Electron Device Letters, IEEE
(Volume:21
,
Issue:
3
)
Date of Publication: March 2000