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Waveguide fabrication for integrated optics by electron beam irradiation of silica

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3 Author(s)
D. Barbier ; Dept. of Electr. Eng., Imperial Coll., London, UK ; M. Green ; S. J. Madden

The electron beam process is used to make a variety of optical waveguides in silica. The process uses beam energies in the vicinity of 25 keV to make monomode through to three-moded slab waveguides from 2 to 7-μm deep with peak-index variations ranging from 10-3 to 10-2. Different types of silica were irradiated and the lowest measured losses were 0.3 dB/cm. It is shown that the major loss process arises from surface imperfections at the air/silica interface. The guides are stable up to 400°C. The results show that the use of electron irradiation to increase the refraction index of silica has considerable potential in the technology of integrated optics

Published in:

Journal of Lightwave Technology  (Volume:9 ,  Issue: 6 )