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Effects of O ion dose on the formation of copper oxide nanoparticles in silica glasses by implantation with high-energy Cu and O ions

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9 Author(s)
Nakao, S. ; Nat. Ind. Res. Inst. of Nagoya, Japan ; Ikeyama, M. ; Tazawa, M. ; Jin, Ping
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Implantation into silica glasses with O and Cu ions and subsequently thermal annealing in vacuum were carried out, and the optical and structural changes were examined as a function of O ion dose by optical absorption and thin film X-ray diffraction measurements. In the Cu implantation alone, Cu nanoparticles were formed in the silica glasses after annealing at 800-1000°C. On the other hand, co-implantation of O and Cu ions suppressed the growth of Cu nanoparticles, and promoted the formation of Cu2O nanoparticles. Further increase in the O ion dose led to the formation of CuO nanoparticles as well as Cu2O nanoparticles

Published in:

Ion Implantation Technology Proceedings, 1998 International Conference on  (Volume:2 )

Date of Conference:

Dec 1999