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Optimized charge control for high current ion implantation

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14 Author(s)
Mack, M.E. ; Semicond. Equipment Div., Eaton Corp., Beverly, MA, USA ; Pharand, M. ; Ameen, M.S. ; Graf, M.
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A plasma flood system has been developed, having an electron temperature of only 1 eV and a current capability in excess of 100 mA. The design has been carefully optimized to minimize metals contamination, maximize lifetime and maintain arc stability during photoresist outgassing. A self checking feature has been built in to ensure effective operation

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Ion Implantation Technology Proceedings, 1998 International Conference on  (Volume:1 )

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