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Versatile patterning process for semiconductors based on microcontact printing

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7 Author(s)
G. Schmidt ; Phys. Inst., Wurzburg Univ., Germany ; M. Tormen ; G. Muller ; L. W. Molenkamp
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A new patterning process based on the microcontact printing of self-assembled monolayers on gold is presented. The method is readily adapted to processes utilising standard optical or electron beam resists, and is fully compatible with industrial semiconductor fabrication technology. The process can also be applied to surfaces which exhibit extreme nonplanarity such as sharp edges of mesas or etch grooves

Published in:

Electronics Letters  (Volume:35 ,  Issue: 20 )