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Inspection optimization for excursion and baseline defect monitoring in a manufacturing environment

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3 Author(s)
Sajoto, D. ; Cypress Semicond., Bloomington, MN, USA ; Gordon, A. ; McCauley, A.

This paper proposes a methodology for inspection optimization by utilizing correlation results between in-line defect to end-of-line bit failure, demonstrates its advantages, and shows how to achieve balance between the effectiveness and the efficiency of in-line defect inspection

Published in:

Semiconductor Manufacturing Conference Proceedings, 1999 IEEE International Symposium on

Date of Conference:

1999