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Environmentally conscious APM: efficient dilution based on theoretical approach

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2 Author(s)
Kobayashi, T. ; Semicond. Oper., IBM Japan Ltd., Shiga, Japan ; Inoue, Y.

A more efficient APM dilution method was introduced into our manufacturing process, along with an advanced model. The new chemical mixing ratio of diluted APM was fixed at NH4OH/H2O 2/H2O=1/2/40 theoretically. The performance of diluted APM in cleaning technique and semiconductor characteristics is equivalent or superior to that of conventional APM. Application of this new diluted APM to our semiconductor wet cleaning process has drastically reduced chemical consumption and the waste volume of ammonia and hydrogen peroxide. This activity indicates one direction for realizing a low cost and environmentally conscious wet cleaning process

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Semiconductor Manufacturing Conference Proceedings, 1999 IEEE International Symposium on

Date of Conference: