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Highly defined narrow track write heads fabricated by focused ion beam trimming with the Al2O3 refilling process

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4 Author(s)
Ishi, T. ; Memory Res. Labs., NEC Corp., Tokyo, Japan ; Nonaka, Y. ; Matsubara, T. ; Ishiwata, N.

We have developed a focused ion beam trimmed write head using Al 2O3 refilling, in which an Al2O3 film was deposited and a two-step lapping process was performed after FIB trimming at the air bearing surface. This process provided highly defined pole edges without any rounded corners, well-filled hollows, and a damage-free read element. Good environment-proof characteristics were also obtained, because a diamond-like carbon film was deposited as a protective layer on the element after FIB trimming. The fabricated head showed good overwrite characteristics in half-micron width writing

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Magnetics, IEEE Transactions on  (Volume:35 ,  Issue: 5 )