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High-resistive (CoFeB)-(SiO2) soft magnetic amorphous film for micro-cores in a few MHz range

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3 Author(s)
M. Munakata ; Energy Electron. Lab., Kumamoto Inst. of Technol., Japan ; M. Yagi ; Y. Shimada

Highly resistive (CoFeB)-(SiO2) amorphous films were deposited on glass substrates and polyimide sheets by synchronous dual-rf magnetron sputtering. SiO2 volume fraction dependence of magnetic properties and resistivity was investigated. The as-deposited films for SiO2 volume fraction υ=20 vol.% had low coercivities of Hc=0.2-0.3 Oe, together with high resistivities of 1500-2200 μ Ω cm. The film exhibited an anisotropy field 40 Oe, a relative permeability of 200 and a saturation magnetization of 7.3 kG. The core loss of the films was 1-1.5 J/m3 at 1 MHz for maximum flux density Bm=0.1 T. The loss was found to be as low as those of Co-based ultra-thin ribbons. The films are useful as thin film cores in the micromagnetic elements which work in the MHz range

Published in:

IEEE Transactions on Magnetics  (Volume:35 ,  Issue: 5 )