By Topic

Particle-in-cell plus direct simulation Monte Carlo (PIC-DSMC) approach for self-consistent plasma-gas simulations

Sign In

Cookies must be enabled to login.After enabling cookies , please use refresh or reload or ctrl+f5 on the browser for the login options.

Formats Non-Member Member
$31 $13
Learn how you can qualify for the best price for this item!
Become an IEEE Member or Subscribe to
IEEE Xplore for exclusive pricing!
close button

puzzle piece

IEEE membership options for an individual and IEEE Xplore subscriptions for an organization offer the most affordable access to essential journal articles, conference papers, standards, eBooks, and eLearning courses.

Learn more about:

IEEE membership

IEEE Xplore subscriptions

3 Author(s)
Serikov, Vladimir V. ; Nippon Sheet Glass Co. Ltd., Chiba, Japan ; Kawamoto, S. ; Nanbu, K.

The particle-in-cell (PIC) and direct simulation Monte Carlo (DSMC) approaches have been combined into a PIC-DSMC model for self-consistent simulations of low-temperature collisional plasmas and the background gas. This novel approach is based on the weighting collision simulation scheme allowing for disparate number densities and time scales of different species. The applicability of the developed algorithm is illustrated by simulations of one-dimensional direct current and two-dimensional magnetron sputtering discharges in argon. An appreciable effect of the energetic discharge species on the density, temperature, and flow field of the background gas shows the importance of the coupled plasma-gas simulation for such technologies as sputtering, dry etching, plasma enhanced vapor deposition, etc

Published in:

Plasma Science, IEEE Transactions on  (Volume:27 ,  Issue: 5 )