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Dependence of resonance condition on pressure in an RF resonance method

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1 Author(s)
Goto, N. ; Komae Res. Lab., Central Res. Inst. of Electr. Power Ind., Tokyo, Japan

The plasma density is shown as functions of pressure and magnetic flux density in an RF resonance method using the XPDP1 simulation code. The RF resonance method has the unique feature that a strong electric field in bulk controls the plasma density. Owing to the balance between the electric field decrease and the collision rate increase, the plasma density in the RF resonance method has a peak with respect to pressure. The plasma density with respect to the magnetic flux density depends on the condition of the RF resonance method, and the dependence is strong at low pressure because of the strong resonance. Sheath thickness is the most important parameter that determines the strength of the resonance induced. It is shown that the sheath thickness s is related to the plasma density n as a function of ns, obtained from a dispersion relation at constant external parameters. The magnetic flux density which induces the strong resonance is determined from sheath thickness. The plasma density in the RF resonance method can be predicted from discharge parameters using the relation between plasma density and sheath thickness

Published in:

Plasma Science, IEEE Transactions on  (Volume:27 ,  Issue: 5 )

Date of Publication:

Oct 1999

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