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Plasma vacuum ultraviolet emission in a high density etcher

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3 Author(s)
Cismaru, C. ; Center for Plasma-Aided Manuf., Wisconsin Univ., Madison, WI, USA ; Shohet, J.L. ; McVittie, J.P.

This work investigates the vacuum ultraviolet (VUV) emission and its impact on SiO2 conductivity in an electron cyclotron resonance (ECR) etcher. Absolute measurements of plasma VUV emission at processing pressures between 0.5 mtorr and 5 mtorr and microwave powers between 700 W and 1300 W show levels of irradiance at the wafer position of the order of tenths of mW/cm2 and integrated photon fluxes in the 1014 photons/cm2s range. In-situ measurements of SiO2 conductivity under direct exposure to the plasma scale with the intensity of the VUV radiation. The measured level of VUV emission from various feed gases is sufficient to induce radiation damage in typical MOS devices in the form of flatband voltage shift and inversion of lightly doped substrates

Published in:

Plasma Process-Induced Damage, 1999 4th International Symposium on

Date of Conference:

1999

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