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Compounding effects of UV exposure, ion bombardment, electron shading and plasma charging in a high density plasma poly etcher

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4 Author(s)
Shyue-Shyh Lin ; Deep Submicron Technol. Div., Ind. Technol. Res. Inst., Hsinchu, Taiwan ; Tsui, Bing-Yue ; Chia-Shone Tsai ; Hsia, C.C.

A complete set of test structures was developed to monitor the compounding effects of UV exposure, ion bombardment, electron shading and plasma charging in a HDP poly etcher. Electron shading-enhanced ion bombardment damage was observed in our experiments. We also found that UV exposure does enhance plasma charging damage

Published in:

Plasma Process-Induced Damage, 1999 4th International Symposium on

Date of Conference:

1999