By Topic

Evaluation of a fast defect detection tool to disposition product wafers with large defects in printed photoresist

Sign In

Cookies must be enabled to login.After enabling cookies , please use refresh or reload or ctrl+f5 on the browser for the login options.

Formats Non-Member Member
$31 $13
Learn how you can qualify for the best price for this item!
Become an IEEE Member or Subscribe to
IEEE Xplore for exclusive pricing!
close button

puzzle piece

IEEE membership options for an individual and IEEE Xplore subscriptions for an organization offer the most affordable access to essential journal articles, conference papers, standards, eBooks, and eLearning courses.

Learn more about:

IEEE membership

IEEE Xplore subscriptions

6 Author(s)
Grindle, S. ; IBM Microelectron. Div., Essex Junction, VT, USA ; Bilodeau, M. ; Otis, M. ; Barnum, J.
more authors

Summary form only given. KLA-Tencor has installed a new, fast, 50 micron defect detection tool on line at IBM Burlington, staffed by IBM and KLA-Tencor engineers and operators. The KT2401 simultaneously scans entire wafers while storing and presenting a pass/fail recommendation to the operator for review. The KT2401 is used in combination with optical microscope review stations to disposition wafers and diagnose root causes of defects. We evaluated the capability of the KT2401 to: 1) randomly sample the range of products and photo levels; 2) gauge the defects from a targeted tool set; 3) gauge the defects from a targeted process point; 4) quantify the population of photolithography process defects. We describe the potential for process improvements provided by use of the KT2401 by quantifying the rate of rework, the types of defects found, and root causes identified

Published in:

Advanced Semiconductor Manufacturing Conference and Workshop, 1999 IEEE/SEMI

Date of Conference:

1999