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A new systematic yield ramp methodology

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5 Author(s)
K. Nemoto ; Production Eng. Res. Lab., Hitachi Ltd., Yokohama, Japan ; K. Walanabe ; M. Ono ; Y. Ikedaa
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This paper presents a systematic yield ramp methodology that is based on defect reduction. The proposed approach uses statistical regression analysis to find the origin of the defects associated with yield loss. Moreover, in order to verify its usefulness, the proposed methodology is applied to high volume memory device production resulting in yield improvement due to shortening the time required for defect elimination

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Advanced Semiconductor Manufacturing Conference and Workshop, 1999 IEEE/SEMI

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