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A new wafer-level measurement technique, the differential gate antenna analysis, has been developed to detect weaknesses in sub-micrometer oxide. This simple technique involves the use of dual antenna structures with different gate oxide areas but the same antenna area ratio. The critical parameter is the difference in their failure levels. It is shown that such a differential measurement of antenna failures correlates with product failure during accelerated life testing. The differential antenna structures are thus proven useful for real-time wafer-level monitoring of oxide reliability.