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Gas sensing characteristics and transformation phenomena in Fe-O thin film

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4 Author(s)
Kim, B.J. ; Dept. of Mater. Eng., Chung-Buk Nat. Univ., South Korea ; Lee, E.T. ; Jang, G.E. ; Lee, D.D.

Fe-O thin films were prepared on Al2O3 substrates by PECVD (Plasma-Enhanced Chemical Vapor Deposition). The phase transformation of Fe-O thin films was mainly controlled by the substrate temperature and the reduction-oxidation process. The as deposited α-Fe2O3 phase was most stable at a deposition temperature around 120°C. The Fe3O4 phase was obtained by the reduction process of α-Fe2O 3 phase in H2 ambience or in the deposition range from 200 to 300°C. The Fe3O4 phase could be transformed into a γ-Fe2O3 phase under controlled oxidation conditions at 280~300°C. The phase transformation phenomenon from Fe3O4 to γ-Fe 2O3 suggests oxidation of Fe2+ ions to Fe3+ in Fe3O4. The prepared α-Fe 2O3 and γ-Fe2O3 thin film showed excellent sensitivity to reducing gases of CO and C4 H10

Published in:
Applications of Ferroelectrics, 1998. ISAF 98. Proceedings of the Eleventh IEEE International Symposium on

Date of Conference: 1998

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