Fe-O thin films were prepared on Al2O3 substrates by PECVD (Plasma-Enhanced Chemical Vapor Deposition). The phase transformation of Fe-O thin films was mainly controlled by the substrate temperature and the reduction-oxidation process. The as deposited α-Fe2O3 phase was most stable at a deposition temperature around 120°C. The Fe3O4 phase was obtained by the reduction process of α-Fe2O 3 phase in H2 ambience or in the deposition range from 200 to 300°C. The Fe3O4 phase could be transformed into a γ-Fe2O3 phase under controlled oxidation conditions at 280~300°C. The phase transformation phenomenon from Fe3O4 to γ-Fe 2O3 suggests oxidation of Fe2+ ions to Fe3+ in Fe3O4. The prepared α-Fe 2O3 and γ-Fe2O3 thin film showed excellent sensitivity to reducing gases of CO and C4 H10
Published in:
Applications of Ferroelectrics, 1998. ISAF 98. Proceedings of the Eleventh IEEE International Symposium on
Date of Conference: 1998