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A method to improve field alignment registration accuracy in VLSI lithography

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4 Author(s)
Jianhai Liu ; Adv. Semicond. Manuf. Corp., Shanghai, China ; Bin Wang ; Xiaoping Zhang ; Li, Bing‐Zong

A method which put some base marks onto a wafer prior to the first layer exposure to improve the registration accuracy of a field alignment lithographic system like Ultratech 1500 stepper has been introduced. The method can avoid a production disaster which may seriously affect the package yield and provide a high device yield, similar to the average yield of conventional processed lots

Published in:

Solid-State and Integrated Circuit Technology, 1998. Proceedings. 1998 5th International Conference on

Date of Conference:

1998