Cart (Loading....) | Create Account
Close category search window

Sub /spl mu/m Nb/AlO/sub x//Nb Josephson junctions fabricated by anodization techniques

Sign In

Cookies must be enabled to login.After enabling cookies , please use refresh or reload or ctrl+f5 on the browser for the login options.

Formats Non-Member Member
$31 $13
Learn how you can qualify for the best price for this item!
Become an IEEE Member or Subscribe to
IEEE Xplore for exclusive pricing!
close button

puzzle piece

IEEE membership options for an individual and IEEE Xplore subscriptions for an organization offer the most affordable access to essential journal articles, conference papers, standards, eBooks, and eLearning courses.

Learn more about:

IEEE membership

IEEE Xplore subscriptions

4 Author(s)
Dolata, R. ; Phys. Tech. Bundesanstalt, Braunschweig, Germany ; Weimann, T. ; Scherer, H.-J. ; Niemeyer, J.

Technological processes for the fabrication of Nb/AlO/sub x//Nb Josephson junctions with areas as small as 0.04 /spl mu/m/sup 2/, based on anodization techniques, are investigated. A cross strip process requiring only two masks is compared with a standard three mask etching and anodization process. Details of the fabrication processes as well as the electrical characterization at 4.2 K and 30 mK of tunnel junctions fabricated by the different methods are presented. Limitations and applications of the two different processes are discussed.

Published in:

Applied Superconductivity, IEEE Transactions on  (Volume:9 ,  Issue: 2 )

Date of Publication:

June 1999

Need Help?

IEEE Advancing Technology for Humanity About IEEE Xplore | Contact | Help | Terms of Use | Nondiscrimination Policy | Site Map | Privacy & Opting Out of Cookies

A not-for-profit organization, IEEE is the world's largest professional association for the advancement of technology.
© Copyright 2014 IEEE - All rights reserved. Use of this web site signifies your agreement to the terms and conditions.