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Sub /spl mu/m Nb/AlO/sub x//Nb Josephson junctions fabricated by anodization techniques

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4 Author(s)
Dolata, R. ; Phys. Tech. Bundesanstalt, Braunschweig, Germany ; Weimann, T. ; Scherer, H.-J. ; Niemeyer, J.

Technological processes for the fabrication of Nb/AlO/sub x//Nb Josephson junctions with areas as small as 0.04 /spl mu/m/sup 2/, based on anodization techniques, are investigated. A cross strip process requiring only two masks is compared with a standard three mask etching and anodization process. Details of the fabrication processes as well as the electrical characterization at 4.2 K and 30 mK of tunnel junctions fabricated by the different methods are presented. Limitations and applications of the two different processes are discussed.

Published in:

Applied Superconductivity, IEEE Transactions on  (Volume:9 ,  Issue: 2 )

Date of Publication:

June 1999

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