Referenced Items are not available for this document.
An overview is given describing applications of multivariable control, signal processing, optimization, modeling and computation to the lithography sequence. We discuss areas in the patterning process where mathematical methods can play a significant role including optical proximity correction, phase shifting mask design, alignment, and stage control for nanopositioning. We also include a discussion on systems applications in the general area of photoresist processing for lithography with emphasis on the thermal process
Published in:
University/Government/Industry Microelectronics Symposium, 1999. Proceedings of the Thirteenth Biennial
Date of Conference: 1999
- Page(s):
- 120 - 122
- Meeting Date :
- 20 Jun 1999-23 Jun 1999
- Print ISBN:
- 0-7803-5240-8
- INSPEC Accession Number:
- 6489442
- Conference Location :
- Minneapolis, MN
- Digital Object Identifier :
- 10.1109/UGIM.1999.782836
- Product Type:
- Conference Publications
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