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The generation of a mesh for resistance calculation in integrated circuits

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3 Author(s)
A. J. Kemp ; Council for Sci. & Ind. Res., Pretoria, South Africa ; J. A. Pretorius ; W. Smit

A method of generating a two-dimensional irregular mesh on a resistive shape is presented. Heuristics are used to identify critical areas where small mesh elements are required. Mesh refinement is applied in these areas until elements are smaller than a specified size. In noncritical areas, elements have a natural tendency to increase in size at a restricted rate. Rapid generation of the mesh is accomplished by using a treelike approach to data processing and by using a restricted set of element types. Although the mesh can be applied to any problem that requires the solution of Laplace's equation with boundary conditions, resistive shapes in integrated circuits are the authors' prime focus. The node elimination technique for resistance calculation is used to demonstrate the effectiveness of the mesh for this purpose

Published in:

IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems  (Volume:7 ,  Issue: 10 )