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Two-dimensional modeling and simulation for dynamic sheath expansion during plasma immersion ion implantation

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3 Author(s)
Shu Qin ; Dept. of Electr. & Comput. Eng., Northeastern Univ., Boston, MA, USA ; Yuanzhong Xhou ; Chung Chan

A pseudo two-dimensional (2-D) analytical model and a 2-D plasma simulator PDP2 code have been utilized to characterize ion-matrix sheath and dynamic sheath expansion during the plasma immersion ion implantation process. The pseudo 2-D model is very simple by involving two geometry factors and yields an acceptable accuracy under the current process conditions. Good agreement between the pseudo 2-D model and PDP2 simulation was observed

Published in:

IEEE Transactions on Plasma Science  (Volume:27 ,  Issue: 3 )