Cart (Loading....) | Create Account
Close category search window
 

Impact of RSF with variable coefficients for CD variation analysis including OPC

Sign In

Cookies must be enabled to login.After enabling cookies , please use refresh or reload or ctrl+f5 on the browser for the login options.

Formats Non-Member Member
$31 $13
Learn how you can qualify for the best price for this item!
Become an IEEE Member or Subscribe to
IEEE Xplore for exclusive pricing!
close button

puzzle piece

IEEE membership options for an individual and IEEE Xplore subscriptions for an organization offer the most affordable access to essential journal articles, conference papers, standards, eBooks, and eLearning courses.

Learn more about:

IEEE membership

IEEE Xplore subscriptions

3 Author(s)
Goda, A. ; ULSI Process Technol. Dev. Center, Matsushita Electron. Corp., Japan ; Misaka, A. ; Odanaka, S.

Optical lithographic processing continues to be the mainstream technology for ⩽0.18 μm generations with the development of wavelength resolution (KrF, ArF), resolution enhancement technology (RET) such as off-axis illumination and phase shifting masks. The ULSI manufacturing process faces CD variation as a new issue (Pforr et al., 1995). Two major factors of CD variation are process variation and the optical proximity effect, which depends on the pattern layout. Hence, statistical gate CD control considering the CD variation caused by these two factors is a key issue in the ULSI manufacturing process. In this paper, we describe the RSF with variable coefficients for CD variation analysis, including mask bias OPC (optical proximity correction). The RSF with variable coefficients to lens conditions NA and σ is newly developed, indicating the nonlinear dependence of CD on the focus position. This approach allows CD variation analysis including mask bias OPC, even when the line width comes close to the stepper wavelength

Published in:

Statistical Metrology, 1999. IWSM. 1999 4th International Workshop on

Date of Conference:

1999

Need Help?


IEEE Advancing Technology for Humanity About IEEE Xplore | Contact | Help | Terms of Use | Nondiscrimination Policy | Site Map | Privacy & Opting Out of Cookies

A not-for-profit organization, IEEE is the world's largest professional association for the advancement of technology.
© Copyright 2014 IEEE - All rights reserved. Use of this web site signifies your agreement to the terms and conditions.