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Visualization of plasma source ion implantation for arrays of multiple targets

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3 Author(s)
Keiter, E.R. ; Parallel Comput. Sci., Sandia Nat. Labs., Albuquerque, NM, USA ; Booske, J.H. ; Hitchon, W.N.G.

Visualization of sheath overlap dynamics during plasma source ion implantation (PSII) of a multiple-target array is used to illustrate the effect of target spacing on dose uniformity over the surface of a single target. The simulations are conducted using a hybrid plasma model, and the images are created using the Tecplot package by Amtec. The simulations suggest scaling rules for sheath overlap time as a function of target spacing.

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Plasma Science, IEEE Transactions on  (Volume:27 ,  Issue: 1 )