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TE01 excitation of an electron cyclotron resonance plasma source

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2 Author(s)
R. L. Kinder ; Dept. of Electr. & Comput. Eng., Illinois Univ., Urbana, IL, USA ; M. J. Kushner

The uniformity of plasma generation in electron cyclotron resonance (ECR) reactors for materials processing, and the subsequent uniformity of fluxes to the substrate, are generally a function of the mode of the microwave radiation injected into the chamber. In the paper, a finite difference time domain (FDTD) simulation is used to demonstrate the consequences of exciting an ECR reactor using a TE01 mode. Due to the off axis peak in the electric field, power deposition and the plasma density peak off axis. Diffraction of the field around the resonance zone produces a secondary maximum in electron density downstream

Published in:

IEEE Transactions on Plasma Science  (Volume:27 ,  Issue: 1 )