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Investigations of rate coefficients in the Cl model

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4 Author(s)
Helmsen, J. ; Metal Etch Div., Appl. Mater. Inc., Sunnyvale, CA, USA ; Hammer, D. ; Yamartino, J. ; Loewenhardt, P.

Investigations of ion distributions in Cl plasmas in the Applied Materials Decoupled Plasma Source chamber have been undertaken through the use of simulation. The Hybrid Plasma Equipment Model plasma simulation software was employed. These simulations were performed to investigate which reactions may be considered significant in the DPS tool according to the current Cl model. In addition, new reactions that have been proposed internally to explain some experimental results were also tested to determine their significance. One of the reactions that was determined to be significant is Cl+ to Cl2+ charge exchange reaction which influences the ratio of Cl+ ions to Cl2+ ions in the DPS chamber. This reaction may influence the ability of Al etch processes to remove Cu residue

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Plasma Science, IEEE Transactions on  (Volume:27 ,  Issue: 1 )