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An effective gate resistance model for CMOS RF and noise modeling

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7 Author(s)
Xiaodong Jin ; Dept. of Electr. Eng. & Comput. Sci., California Univ., Berkeley, CA, USA ; Jia-Jiunn Ou ; Chih-Hung Chen ; Weidong Liu
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A physics-based effective gate resistance model representing the non-quasi-static (NQS) effect and the distributed gate electrode resistance is proposed for accurately predicting the RF performance of CMOS devices. The accuracy of the model is validated with 2D simulations and experimental data. In addition, the effect of the gate resistance on the device noise behavior has been studied with measured data. The result shows that an accurate gate resistance model is essential for the noise modeling.

Published in:

Electron Devices Meeting, 1998. IEDM '98. Technical Digest., International

Date of Conference:

6-9 Dec. 1998