Cart (Loading....) | Create Account
Close category search window
 

Very fast transmission line pulsing of integrated structures and the charged device model

Sign In

Cookies must be enabled to login.After enabling cookies , please use refresh or reload or ctrl+f5 on the browser for the login options.

Formats Non-Member Member
$31 $13
Learn how you can qualify for the best price for this item!
Become an IEEE Member or Subscribe to
IEEE Xplore for exclusive pricing!
close button

puzzle piece

IEEE membership options for an individual and IEEE Xplore subscriptions for an organization offer the most affordable access to essential journal articles, conference papers, standards, eBooks, and eLearning courses.

Learn more about:

IEEE membership

IEEE Xplore subscriptions

2 Author(s)
Gieser, H. ; Fraunhofer-Inst. fur Festkorpertechnologie, Munich, Germany ; Haunschild, M.

Transmission line pulsing (TLP) is well-established for the IV-characterization of electrostatic discharge (ESD)-protection elements. There still is a significant gap between the performance of present TLP-systems and the demands of the charged device model (CDM). A very fast, narrow-pulse (>3.5 ns), high-current TLP (VF-TLP) is designed to reduce this gap. It is feasible to study the pulsed breakdown of gate oxides and to determine at least the quasistatic IV-characteristics of input structures. Gate oxide breakdown is monitored within the first 6 ns of stress. Correlation with CDM (noncontact, nonsocketed) tests and socket discharge model [(SDM) formerly socketed CDM] is achieved in terms of the failure signature. However, the failure thresholds of VF-TLP and CDM/SDM do not correlate due to the different current paths. In the CDM, mobile charge is injected into or coming out of one pin until the full device is at same potential. In the SDM, the full test board is charged and discharged across the device. The VF-TLP current flows between the stress pin and a reference pin for the duration of the square pulse

Published in:

Components, Packaging, and Manufacturing Technology, Part C, IEEE Transactions on  (Volume:21 ,  Issue: 4 )

Date of Publication:

Oct 1998

Need Help?


IEEE Advancing Technology for Humanity About IEEE Xplore | Contact | Help | Terms of Use | Nondiscrimination Policy | Site Map | Privacy & Opting Out of Cookies

A not-for-profit organization, IEEE is the world's largest professional association for the advancement of technology.
© Copyright 2014 IEEE - All rights reserved. Use of this web site signifies your agreement to the terms and conditions.