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Shape-optimized electrooptic beam scanners: analysis, design, and simulation

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4 Author(s)
Yi Chiu ; Dept. of Electr. & Comput. Eng., Carnegie Mellon Univ., Pittsburgh, PA, USA ; Jie Zou ; D. D. Stancil ; T. E. Schlesinger

This paper presents the analysis of a general nonrectangular electrooptic (EO) scanner and compare its performance to a rectangular device. Since the scanning sensitivity of an EO scanner is inversely proportional to its width, high sensitivity requires the device contour to be close to the ray trajectory of a beam propagating through the device. Accordingly, a shaped-optimized scanner is designed so that the beam trajectory at maximum deflection is parallel to the device contour. A beam propagation method (BPM) simulation shows the performance agrees well with the analysis

Published in:

Journal of Lightwave Technology  (Volume:17 ,  Issue: 1 )