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Characterization of plasmas from a pulsed jet discharge for applications VUV spectroscopy and micromechanics

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5 Author(s)
H. Phillips ; Dept. of Electr. & Comput. Eng., Rice Univ., Houston, TX, USA ; S. Kubodera ; R. Sauerbrey ; F. K. Tittel
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Plasmas from a pulsed jet discharge have been characterized with respect to gas species and nozzle design. Spectral lines from the gas used in the pulsed nozzle are apparent in the visible region. The vacuum ultraviolet spectrum, particularly for heavier gases, is dominated by emission from species sputtered from the nozzle. The production of highly ionized and excited states from materials created by the sputtering of the nozzle has possible applications in VUV (vacuum ultraviolet) spectroscopy. Operating the pulsed jet discharge at a 50-Hz repetition rate with NF3 to produce excited fluorine ions allowed etch rates in excess of 10 μm/min to be achieved in silicon; this may have applications to micromechanics

Published in:

IEEE Journal of Quantum Electronics  (Volume:27 ,  Issue: 1 )