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Dynamic modelling analysis for control of CVD

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5 Author(s)
Gevelber, M.A. ; Dept. of Manuf. Eng., Boston Univ., MA, USA ; Bufano, M. ; Toledo-Quinones, M. ; Brown, D.
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A nonlinear dynamic model of the chemical vapor deposition (CVD) process has been developed and analyzed to obtain insight into the design of an appropriate control structure.

Published in:

American Control Conference, 1994  (Volume:3 )

Date of Conference:

29 June-1 July 1994