By Topic

Dynamic modelling analysis for control of CVD

Sign In

Cookies must be enabled to login.After enabling cookies , please use refresh or reload or ctrl+f5 on the browser for the login options.

Formats Non-Member Member
$33 $13
Learn how you can qualify for the best price for this item!
Become an IEEE Member or Subscribe to
IEEE Xplore for exclusive pricing!
close button

puzzle piece

IEEE membership options for an individual and IEEE Xplore subscriptions for an organization offer the most affordable access to essential journal articles, conference papers, standards, eBooks, and eLearning courses.

Learn more about:

IEEE membership

IEEE Xplore subscriptions

5 Author(s)
M. A. Gevelber ; Dept. of Manuf. Eng., Boston Univ., MA, USA ; M. Bufano ; M. Toledo-Quinones ; D. Brown
more authors

A nonlinear dynamic model of the chemical vapor deposition (CVD) process has been developed and analyzed to obtain insight into the design of an appropriate control structure.

Published in:

American Control Conference, 1994  (Volume:3 )

Date of Conference:

29 June-1 July 1994