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Stress control for process optimization of the capacitive pressure sensors for biomedical applications achieved by surface micromachining technology

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8 Author(s)
F. Gaiseanu ; Nat. Inst. of Res.-Dev. for Microtechnol., Bucharest, Romania ; C. Postolache ; D. Dascalu ; J. Esteve
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An integrated structure of capacitive pressure sensor for biomedical applications achieved by surface micromachining technology, consisting in the pressure sensor and a testing component is presented. The test structure permitted to apply the pull-in voltage method for the evaluation of the residual stress in the polysilicon layer on the basis of a new form of the set of two equations describing the beam pull-in voltage effect. The integrated structure allowed the optimization of the phosphorus diffusion process to obtain low stress polysilicon membranes of the capacitive pressure sensors for biomedical applications

Published in:

Semiconductor Conference, 1998. CAS '98 Proceedings. 1998 International  (Volume:1 )

Date of Conference:

6-10 Oct 1998