By Topic

X-ray lithography source (SXLS) vacuum system

Sign In

Cookies must be enabled to login.After enabling cookies , please use refresh or reload or ctrl+f5 on the browser for the login options.

Formats Non-Member Member
$31 $13
Learn how you can qualify for the best price for this item!
Become an IEEE Member or Subscribe to
IEEE Xplore for exclusive pricing!
close button

puzzle piece

IEEE membership options for an individual and IEEE Xplore subscriptions for an organization offer the most affordable access to essential journal articles, conference papers, standards, eBooks, and eLearning courses.

Learn more about:

IEEE membership

IEEE Xplore subscriptions

5 Author(s)
Schuchman, Joseph C. ; Brookhaven Nat. Lab., Upton, NY, USA ; Aloia, J. ; Hsieh, H. ; Kim, T.
more authors

In 1988 Brookhaven National Laboratory (BNL) was awarded a contract to design and construct a compact light source for X-ray lithography. The contract is for an electron storage ring designed for 690-MeV 500-MeV 500-mA operations. It has a racetrack configuration with a circumference to 8.5 m. The machine is to be constructed in two phases. Phase I (200 MeV, 500 mA) is primarily for low-energy injection studies and incorporates all-room-temperature magnets. For phase II the two room-temperature dipole magnets are replaced with (4 T) superconducting magnets and operation is at 690 MeV. The vacuum system for this machine is described. This vacuum system must satisfy three basic requirements. First, it must provide a dynamic pressure (pressure with stored beam) of 10-9 torr or better to minimize electron-beam-residual-gas interaction. Second, it must be able to recover from venting to atmosphere, deliberately or accidentally, in a reasonably short time. Third, it should require little operator intervention for normal operation

Published in:

Particle Accelerator Conference, 1989. Accelerator Science and Technology., Proceedings of the 1989 IEEE

Date of Conference:

20-23 Mar 1989