Cart (Loading....) | Create Account
Close category search window
 

In-situ particle monitoring in a vertical poly furnace

Sign In

Cookies must be enabled to login.After enabling cookies , please use refresh or reload or ctrl+f5 on the browser for the login options.

Formats Non-Member Member
$31 $13
Learn how you can qualify for the best price for this item!
Become an IEEE Member or Subscribe to
IEEE Xplore for exclusive pricing!
close button

puzzle piece

IEEE membership options for an individual and IEEE Xplore subscriptions for an organization offer the most affordable access to essential journal articles, conference papers, standards, eBooks, and eLearning courses.

Learn more about:

IEEE membership

IEEE Xplore subscriptions

3 Author(s)
Glass, P. ; Microelectron. Div., IBM Corp., Essex Junction, VT, USA ; Kudlacik, J. ; Burghard, R.

In-situ particle monitoring (ISPM) is a key semiconductor initiative as wafer production facilities strive to reduce operating costs. The benefits of using ISPM include real-time process monitoring, reduced tool qualification costs and improved product cycle time (Pham et al., 1995; Scharnagl, 1996). All of these improvements lead to increased manufacturing productivity and a lower operating cost (Burghard et al., 1992). This paper describes the production implementation of an in-situ particle monitor on an LPCVD vertical furnace. The furnace is a high-risk, critical process to monitor in real time because of the large number of wafers processed in each batch. Correlation between surface scanner counts, ISPM counts, test yield and process trending is discussed, along with sensor reliability and a future plan for statistical control

Published in:

Advanced Semiconductor Manufacturing Conference and Workshop, 1998. 1998 IEEE/SEMI

Date of Conference:

23-25 Sep 1998

Need Help?


IEEE Advancing Technology for Humanity About IEEE Xplore | Contact | Help | Terms of Use | Nondiscrimination Policy | Site Map | Privacy & Opting Out of Cookies

A not-for-profit organization, IEEE is the world's largest professional association for the advancement of technology.
© Copyright 2014 IEEE - All rights reserved. Use of this web site signifies your agreement to the terms and conditions.