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Study Of Bottom Antireflective Coating Process Using A High-Transparency Resist For ArF Excimer Laser Lithography

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4 Author(s)
Kishimura, Shinji ; Association of Super-Advanced Electronics Technologies ; Takahashi, M. ; Ohfuji, Takeshi ; Sasago, M.

First Page of the Article

Published in:

Microprocesses and Nanotechnology Conference, 1998 International

Date of Conference:

13-16 July 1998