By Topic

Application Of New Empirical Model To The Electron Beam Lithography Process With Chemically Amplified Resists

Sign In

Cookies must be enabled to login.After enabling cookies , please use refresh or reload or ctrl+f5 on the browser for the login options.

Formats Non-Member Member
$31 $13
Learn how you can qualify for the best price for this item!
Become an IEEE Member or Subscribe to
IEEE Xplore for exclusive pricing!
close button

puzzle piece

IEEE membership options for an individual and IEEE Xplore subscriptions for an organization offer the most affordable access to essential journal articles, conference papers, standards, eBooks, and eLearning courses.

Learn more about:

IEEE membership

IEEE Xplore subscriptions

4 Author(s)
Young-Mog Ham ; Hyundai Electronics Industries Co. Ltd. ; Cheol Hur ; Chang-Nam Ahn ; Ki-Ho Baik

First Page of the Article

Published in:

Microprocesses and Nanotechnology Conference, 1998 International

Date of Conference:

13-16 July 1998