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Application Of New Empirical Model To The Electron Beam Lithography Process With Chemically Amplified Resists

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3 Author(s)
Young-Mog Ham ; Hyundai Electronics Industries Co. Ltd. ; Cheol Hur ; Ki-Ho Baik

First Page of the Article

Published in:

Microprocesses and Nanotechnology Conference, 1998 International

Date of Conference:

13-16 July 1998